Fujifilm to Upgrade Semiconductor Factories in Japan for Cutting-Edge Materials

TapTechNews September 30th news, Fujifilm Corporation announced today that it will upgrade the semiconductor factories of its subsidiaries located in Shizuoka Prefecture and Oita Prefecture in Japan to develop cutting-edge semiconductor materials that can be used for semiconductors with processes below 2nm.

The investment amounts of the two factories in Yoshida-cho, Shizuoka Prefecture and Oita City are approximately 13 billion yen (TapTechNews note: currently about 636 million yuan) and 70 billion yen (currently about 342 million yuan) respectively. It is planned to start new plants in autumn 2025 and spring 2026, and new inspection equipment will be introduced at that time to develop cutting-edge products such as 'photoresist'.

In addition to photoresist, Fujifilm also has semiconductor materials such as photosensitive materials, photolithography peripheral materials and CMP slurry, such as the development of image sensor materials, cleaning products, and resist products for photomasks.