Thanks to the clue provided by TapTechNews reader Diixx! TapTechNews reported on May 15 that Dr. Zhang Xiaqiang of TSMC attended a technical seminar in Amsterdam on May 14, where he bluntly said, 'ASML's High-NAEUV is too expensive. I really like the capabilities of High-NAEUV, but I don't like its price.' Dr. Zhang Xiaqiang currently serves as the senior vice president and co-chief operating officer of TSMC's business development and overseas operations office, responsible for the company's business strategy, including technology blueprints, customer communication and interactions. In February of this year, TapTechNews reported that Dutch semiconductor equipment giant ASML announced that the price of the High-NATwinscanEXE lithography machine is approximately 350 million euros (approximately 27.16 billion RMB). In contrast, the price of the existing EUV lithography machine is approximately 170 million euros (approximately 13.19 billion RMB). Intel has already purchased ASML's High-NAEUV equipment and announced on April 19 the assembly of the first commercial High-NAEUV lithography machine. Dr. Zhang Xiaqiang stated in the interview that TSMC's A16 advanced process node (scheduled for mass production by the end of 2026) may not necessarily need to use ASML's High-NAEUV setup and can continue to use existing older EUV equipment. He said, 'I believe that the current EUV equipment is capable of supporting A16 at this stage.' Dr. Zhang Xiaqiang indicated that the timing of using ASML's latest technology will depend on when it is most cost-effective and also needs to balance TSMC's technological capabilities.