TapTechNews June 5th news. According to a report by Nikkei today, the draft of the basic policy on economic and financial operations and reform that the Japanese government will finalize in late June has been made public. In order to promote the mass production of next-generation semiconductors, the local government has included the policy of improving relevant laws. The draft mentions that in order to realize the mass production of next-generation semiconductors, necessary legal measures will be studied.
It is also reported that some analysts believe that the draft takes into account the 2-nanometer semiconductor that Rapidus aims to mass produce before 2027. Rapidus believes that mass production requires 5 trillion yen (TapTechNews note: currently about 233.5 billion Chinese yuan), but currently only about 1 trillion yen (currently about 46.7 billion Chinese yuan) subsidy for research and development and a small amount of investment from the private sector have been secured.
There is an opinion within the Japanese government that if there is a legal basis to guarantee financial support for mass production, it will be easier to attract medium and long-term investments including private funds. There is also an opinion advocating that legislation should be promoted under the purpose of ensuring a stable source of funding in order to avoid lax fiscal discipline.
In addition to this, the draft also proposed to strive to formulate and implement an autonomous driving plan that operates throughout the year in all prefectures by the 2025 fiscal year, aiming to solve the problem of insufficient bus and truck drivers.
The draft also proposed a skill remodeling policy aiming to improve the ability of about 5000 people by 2029, and an attempt to change the monopoly of the smartphone operating system and fundamentally strengthen the Fair Trade Commission and other policies.
According to a previous report by TapTechNews, Henri Richard, the head of Rapidus' US subsidiary Rapidus Design Solutions, said that Rapidus is currently very satisfied with the 0.33NA (LowNA) EUV lithography solution used in its 2-nanometer node. In addition to the 2-nanometer process planned for trial production in 2025 and mass production in 2027, the next stage of 1.4-nanometer has already been planned within Rapidus.