#lithography#

ASML's Plan to Launch Hyper-NA EUV Lithography Machine in 2030

ASML plans to launch Hyper-NA EUV lithography machine in 2030, facing challenges in light polarization and resistance.

Rapidus' Process and Future Plans

Rapidus' first-generation process won't use High-NA EUV lithography, and its plans for 2nm and 1.4nm, as well as its market share prospects.